| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate with a light shielding film hardly causing defects such as pattern deflects. SOLUTION: In the substrate on which a light shielding film having a multilayered structure is formed, the uppermost layer of the light shielding film farthest from the substrate contains 40 to 80 atm.% chromium, 10 to 40 atm.% oxygen and 10 to 50 atm.% nitrogen, and the second layer adjacent to the uppermost layer contains 70 atm.% to <100 atm.% chromium and nitrogen with lower concentration than in the uppermost layer or contains 70 to 100 atm.% chromium and no nitrogen. |
