发明名称 |
LASER CLEANING METHOD, METHOD OF MANUFACTURING RETICLE SUBSTRATE AND LASER CLEANING EQUIPMENT |
摘要 |
<p>PROBLEM TO BE SOLVED: To remove the foreign matter sticking to the surfaces of reticle substrates and the like. SOLUTION: This method has a dropping process step (S4) of dropping a prescribed amount of liquid drops to the position deposited with the foreign matter of the surface of a previously perceived work W and a process step (S6) of removing the foreign matter by irradiating the position deposited with the foreign matter with a laser beam L having energy capable of evaporating at least the liquid drops described above.</p> |
申请公布号 |
JP2002182370(A) |
申请公布日期 |
2002.06.26 |
申请号 |
JP20000378427 |
申请日期 |
2000.12.13 |
申请人 |
TOSHIBA CORP |
发明人 |
OBARA TAKASHI |
分类号 |
G03F1/82;G03F7/20;H01L21/027;H01L21/304;(IPC1-7):G03F1/08 |
主分类号 |
G03F1/82 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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