发明名称 LASER CLEANING METHOD, METHOD OF MANUFACTURING RETICLE SUBSTRATE AND LASER CLEANING EQUIPMENT
摘要 <p>PROBLEM TO BE SOLVED: To remove the foreign matter sticking to the surfaces of reticle substrates and the like. SOLUTION: This method has a dropping process step (S4) of dropping a prescribed amount of liquid drops to the position deposited with the foreign matter of the surface of a previously perceived work W and a process step (S6) of removing the foreign matter by irradiating the position deposited with the foreign matter with a laser beam L having energy capable of evaporating at least the liquid drops described above.</p>
申请公布号 JP2002182370(A) 申请公布日期 2002.06.26
申请号 JP20000378427 申请日期 2000.12.13
申请人 TOSHIBA CORP 发明人 OBARA TAKASHI
分类号 G03F1/82;G03F7/20;H01L21/027;H01L21/304;(IPC1-7):G03F1/08 主分类号 G03F1/82
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