PHOTOMASK, METHOD FOR INSPECTING PATTERN DEFECT AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To accurately inspect pattern defects by utilizing a mask size checking mark formed in a photomask. SOLUTION: The photomask has a product pattern and a mask size checking mark 3 disposed on the periphery of the product pattern. The mask size checking mark 3 includes a line pattern 4 having a line width equal to that of the product pattern and a reference pattern 5 disposed next to the line pattern 4 and having a larger width than the line pattern 4.