发明名称 VALVE FOR GAS/LIQUID MIXING AND SUBSTRATE TREATMENT APPARATUS USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a gas/liquid mixing valve that feeds a treating solution containing a dissolved gas in a real-time manner and to provide a substrate treatment apparatus using the same. SOLUTION: A treatment solution passage 7 is formed at the side of the body of a lower valve case 1b constituting a gas/liquid mixing valve 1, and a pipe that passes the solution is connected to the passage 7. The passage 7 is connected to a gas chamber 3a through a gas passage. When compressed air is introduced into the chamber 3a from an operating air feed port 17, the opening of the gas passage 15 is released from a stem 5b, and when carbon dioxide is introduced from a gas feed port 19 into the chamber 3a, the carbon dioxide divided into fine gas bubbles through the passage 15 is mixed with pure water passed through the passage 7. Therefore, it is possible to promptly mix the carbon dioxide with the pure water passed through the pipe and to allow it to remain dissolved in it.
申请公布号 JP2002177827(A) 申请公布日期 2002.06.25
申请号 JP20000378785 申请日期 2000.12.13
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KITAZAWA HIROYUKI
分类号 B08B3/04;B05B7/26;B08B3/10;H01L21/027;H01L21/304;(IPC1-7):B05B7/26 主分类号 B08B3/04
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