发明名称 SEMICONDUCTOR REPAIRING APPARATUS INCLUDING UNIT FOR REMOVING PARTICLES GENERATED IN FUSE BLOW PROCESS
摘要 PURPOSE: A semiconductor repairing apparatus including a unit for removing particles generated in a fuse blow process is provided to prevent a repair defect caused by the particles and to basically decrease defects of a semiconductor device, by effectively eliminating the particles. CONSTITUTION: The semiconductor device including a plurality of fuses is repaired in a wafer level. A laser beam generator(22) generates a laser beam and selectively blows the plurality of fuses. A particle eliminating unit(32) eliminates the particles generated in a process for blowing the fuse. A control unit(34) controls the laser beam generator and the particle eliminating unit.
申请公布号 KR20020047489(A) 申请公布日期 2002.06.22
申请号 KR20000075943 申请日期 2000.12.13
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, EUN CHEOL;YOO, JAE SANG
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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