发明名称 |
SEMICONDUCTOR REPAIRING APPARATUS INCLUDING UNIT FOR REMOVING PARTICLES GENERATED IN FUSE BLOW PROCESS |
摘要 |
PURPOSE: A semiconductor repairing apparatus including a unit for removing particles generated in a fuse blow process is provided to prevent a repair defect caused by the particles and to basically decrease defects of a semiconductor device, by effectively eliminating the particles. CONSTITUTION: The semiconductor device including a plurality of fuses is repaired in a wafer level. A laser beam generator(22) generates a laser beam and selectively blows the plurality of fuses. A particle eliminating unit(32) eliminates the particles generated in a process for blowing the fuse. A control unit(34) controls the laser beam generator and the particle eliminating unit.
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申请公布号 |
KR20020047489(A) |
申请公布日期 |
2002.06.22 |
申请号 |
KR20000075943 |
申请日期 |
2000.12.13 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, EUN CHEOL;YOO, JAE SANG |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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