METHOD FOR MANUFACTURING OPTICAL WAVEGUIDE USING INDUCTIVE COUPLING PLASMA ETCHING APPARATUS

摘要

PURPOSE: A method is provided to reduce a manufacturing time and improve a productivity by manufacturing an optical waveguide using an inductive coupling plasma etching apparatus. CONSTITUTION: A lower cover(200) and a core layer(300) are sequentially deposited on a substrate(100)(S110). A metal etching mask layer(400) is deposited on the core layer(300)(S120). A photosensitive film is coated on the metal etching mask layer(400) and the photosensitive film and metal etching mask layer(400) are transferred to form a pattern of a two dimensional plane shape(S130). A core layer which is not covered is etched by a mask layer pattern(450) and a square optical waveguide(350) is manufactured(S140). The square optical waveguide(350) is etched and the metal mask layer pattern(450) is removed(S150). An upper cover layer(500) is deposited and the optical waveguide(350) is completed(S160).