APPARATUS AND METHOD FOR TREATING SUBSTRATE AS WELL AS METHOD FOR MANUFACTURING DEVICE PRODUCT

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for treating a substrate capable of properly treating the substrate by improving a liquid drip after supply of a treating liquid is completed. SOLUTION: A through hole 259 for passing a treating liquid supply nozzle 370 is formed at a center of a shielding plate 250 for shielding an upper surface of the substrate. The nozzle 370 has a double cylindrical structure in which a treating liquid tube 378 is internally engaged with a holding tube member 371. A distal end of the nozzle 370 is formed in a taper shape and formed in a sharp shape having no substantially horizontal surface. A discharge port 387a is formed at the distal end. A gas passage 381 for guiding a nitrogen gas to the substrate is formed at the outside of the nozzle 370. A peripheral edge 20 of the opening of the hole 250 is chamfered.