| 摘要 |
PROBLEM TO BE SOLVED: To simplify the configuration and to improve the productivity. SOLUTION: In a facing target type sputtering apparatus for a thin film composite membrane, a pair of targets are disposed facing each other with a prescribed space between them, a plasma capturing magnetic field is formed so as to surround facing spaces between the targets by providing a magnetic field generating means comprising permanent magnets arranged along the outer circumference of the targets, and a plurality of sputtering parts comprising a box-type target unit 10 to seal, by a shielding plate, side surfaces other than an aperture facing the substrate in the facing space of the facing targets generating sputter plasma in the facing space are arranged in a vacuum tank 40, the substrate is carried to each of the sputtering parts by a substrate carrying means 30, and a plurality of films are deposited on the substrate. The sputtering parts (10) are arranged on an upper side wall 41 in an annular manner at prescribed intervals so that the aperture faces downward, and the substrate carrying means 30 is arranged as an annular carrying means so that the substrate faces each aperture in the sputtering part.
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