| 摘要 |
The present invention is directed toward apparatus and methods for providing substrate structures having metallic layers for microelectronics devices. In one embodiment of the invention, an apparatus includes a substrate layer, and a metallic layer attached to the substrate layer, the metallic layer being attachable to a bottom surface of the microelectronics device. The metallic layer may advantageously provide a surface free from voids or irregularities for improved attachment of microelectronics devices. The metallic layer may also provide improved conduction of thermal energy away from the device, shielding from electromagnetic interference, a vapor barrier between the device and the substrate, and may serve as a convenient ground channel. In one embodiment, the metallic layer may be continuous layer. Alternately, the metallic layer may be segmented into a plurality of closely-fitted pieces, or a plurality of spaced-apart pieces separated by expansion joints. In another embodiment, an apparatus may include a second metallic layer formed on the substrate layer opposite from the first metallic layer. In a further embodiment, a plating layer is formed on the second metallic layer. In yet another embodiment, a microelectronics package includes a substrate layer, a metallic layer attached to the substrate layer, an attachment layer formed on at least part of the metallic layer, and a die having a bottom surface attached to the attachment layer. The attachment layer may be an adhesive layer, or alternately, a eutectic layer.
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