OBSERVATION DEVICE AND ITS MANUFACTURING METHOD, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING MICRO DEVICE

摘要

A method for manufacturing an observation device by which the residual aberration including a high-order aberration component of the wave front aberration can be corrected satisfactorily. A method for manufacturing an observation device for observing the image of the surface (WH) to be observed formed through an image-forming a focusing optical system (7, 6, 10, 11, 12 (14)). The method comprises an aberration measuring step of measuring the residual aberration left in the image-forming optical system, and a positioning step of disposing a correction plate (17) at least one of the surfaces of which is aspheric in a predetermined position in the optical path of the image-forming optical system.