发明名称 Reproduction of high-resolution films for - storage systems
摘要 <p>Relief image produced on silver halide film by electron ray or by image-wise exposure of film such as Kodak SO-159 (RTM), and wet development, is contacted with deformable thermoplastic layer; negative relief image is evaluated by irradiating with linear-polarised light and measuring delay of light. Process is used in computer storage systems.</p>
申请公布号 FR2046203(A5) 申请公布日期 1971.03.05
申请号 FR19700013693 申请日期 1970.04.16
申请人 IBM 发明人
分类号 B41C3/06;G03C5/315;G03C11/00;(IPC1-7):03C5/00;03F7/00 主分类号 B41C3/06
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