发明名称 |
Protecting groups in polymers, photoresists and processes for microlithography |
摘要 |
The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a protecting group. A specific example of a cyclic ether group is an alkylene oxide, such as an oxetane group, substituted with one or more fluorinated alkyl groups. A specific example of a cyclic ester is a lactone which may be substituted with methyl groups. The photoresist composition further includes a photoactive component. The photoresist composition of this invention has a high transparency to ultraviolet radiation, particularly at short wavelengths such as 193 nm and 157 nm. |
申请公布号 |
AU2576602(A) |
申请公布日期 |
2002.06.11 |
申请号 |
AU20020025766 |
申请日期 |
2001.11.26 |
申请人 |
E.I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
ANDREW E. FEIRING;VIACHESLAV ALEXANDROVICH PETROV;III FRANK L. SCHADT;BRUCE EDMUND SMART |
分类号 |
C08F216/16;C08F224/00;C08F232/04;G03F7/004;G03F7/038;G03F7/039;H01L21/027 |
主分类号 |
C08F216/16 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|