发明名称 THREE-DIMENSIONAL MEMORY ARRAY AND METHOD OF FABRICATION
摘要 A multi-level memory array is described employing rail-stacks. The rail-stacks include conductor (40) and semiconductor layers (38, 39 and 41). The layers are generally separated by an insulating layer used to form antifuses (42). In one embodiment, one-half the diode is located in one rail-stack and the other half in the other rail-stack. Methods for fabricating a multi-level memory array are also provided.
申请公布号 WO0184553(A3) 申请公布日期 2002.06.06
申请号 WO2001US13575 申请日期 2001.04.25
申请人 MATRIX SEMICONDUCTOR, INC.;KNALL, N., JOHAN;JOHNSON, MARK 发明人 KNALL, N., JOHAN;JOHNSON, MARK
分类号 G11C16/04;H01L21/77;H01L21/8246;H01L21/84;H01L27/06;H01L27/102;H01L27/115 主分类号 G11C16/04
代理机构 代理人
主权项
地址
您可能感兴趣的专利