发明名称 Process for selectively plating areas of a substrate
摘要 A process for the selective activation and plating of a substrate is disclosed. The process involves the application of an activator composition to a substrate in a predetermined pattern by means of a print head wherein the print head moves across the surface of the substrate and selectively deposits the activator composition in said predetermined pattern upon the substrate. The selectively activated substrate is then subjected to electroless plating.
申请公布号 US2002068127(A1) 申请公布日期 2002.06.06
申请号 US20000729410 申请日期 2000.12.04
申请人 DURSO FRANCIS;CASTALDI STEVEN;SAWOSKA DAVID 发明人 DURSO FRANCIS;CASTALDI STEVEN;SAWOSKA DAVID
分类号 C23C18/16;H05K3/18;(IPC1-7):B05D3/10 主分类号 C23C18/16
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