发明名称 Vaporizer and apparatus for vaporizing and supplying
摘要 There are disclosed a vaporizer wherein at least a portion of a CVD material feed portion in contact with a CVD material is constituted of a corrosion resistant synthetic resin; and an apparatus for vaporizing and supplying which comprises a cooler and the vaporizer wherein the inside of the CVD material feed portion of the vaporizer and the surface on the side of the vaporization chamber of the CVD material feed portion are constituted of a corrosion resistant synthetic resin; the feed portion in contact with the outside of the vaporizer is constituted of a metal; and the CVD material feed portion which is constituted of a metal and which undergoes heat transfer from the heating means upon heating the vaporization chamber can be cooled with a cooler. The vaporizer and apparatus, when used for supplying a gaseous CVD-material to CVD equipment for producing semiconductors, enables the CVD material to be efficiently vaporized and supplied at desirable concentration and flow rate without causing deposit or adhesion of the CVD material at a CVD material feed port even if a solid CVD-material is used.
申请公布号 US2002067917(A1) 申请公布日期 2002.06.06
申请号 US20010986901 申请日期 2001.11.13
申请人 JAPAN PIONICS CO., LTD. 发明人 TAKAMATSU YUKICHI;YONEYAMA TAKEO;KIRIYAMA KOJI;ASANO AKIRA;TONARI KAZUAKI;IWATA MITSUHIRO
分类号 H01L21/205;C23C16/44;C23C16/448;(IPC1-7):C23C14/26 主分类号 H01L21/205
代理机构 代理人
主权项
地址