发明名称 |
COATING SOLUTION FOR FORMING HYDROPHILIC SILICA FILM AND METHOD FOR PRODUCING FILM USING THE SOLUTION |
摘要 |
PROBLEM TO BE SOLVED: To obtain a silica film having excellent hydrophilicity. SOLUTION: A substrate is coated with a solution comprising an inorganic substance having <=5μm average particle diameter in a solution obtained by dissolving a silicone alkoxide in an organic solvent or a solution obtained by dissolving a hydrolyzate of the silicon alkoxide or an organic solvent-soluble silicon oxide in the organic solvent, and the coated substrate is dried and calcined at 50-200 deg.C and baked at >=300 deg.C to form unevenness caused by the inorganic substance and generating fine pores or cracks on the surface of the silica film as well. Thereby, a porous film is formed.
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申请公布号 |
JP2002161240(A) |
申请公布日期 |
2002.06.04 |
申请号 |
JP20010261258 |
申请日期 |
2001.08.30 |
申请人 |
CENTRAL GLASS CO LTD |
发明人 |
SUGIMOTO TOSHIAKI;KIDA KENJI;YAMAGUCHI YOSHIKAZU |
分类号 |
C09D183/02;C09D1/00;C23C18/12;(IPC1-7):C09D183/02 |
主分类号 |
C09D183/02 |
代理机构 |
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地址 |
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