| 摘要 |
PURPOSE: To provide a resin for resist which is excellent in etching resistance, resolution, adhesion to substrate and other properties required for the resin for resist. CONSTITUTION: The resin for resist has a molecular structure in which a protecting group conbinds with a base resin, and becomes soluble in an alkaline solution when the protecting residue expressed by the formula (I) (wherein, (Ia) is a 12-25C condensed ring which can contain a substituent group; and R is a 1-4C alkyl group) is eliminated.
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