发明名称 SEMICONDUCTOR TREATING EQUIPMENT PROVIDED WITH CLEAN BOX STOP MECHANISM
摘要 PROBLEM TO BE SOLVED: To solve the problem where a clean box is manufactured generally by molding reinforced plastics based on specification, dimensional difference due to manufacturing error by molding is present, and troubles like collision is generated in the course of transfer of the clean box on equipment. SOLUTION: This semiconductor wafer treating equipment is provided with a clean box having an aperture, a lid for closing the aperture tightly, a door which comes into contact with the lid and isolates the lid from the clean box, a first stopper which moves together with movement of the clean box without changing the relative position relation to the clean box, and a second stopper which does not move.
申请公布号 JP2002151563(A) 申请公布日期 2002.05.24
申请号 JP20000348195 申请日期 2000.11.15
申请人 TDK CORP 发明人 OKABE TSUTOMU;IGARASHI HIROSHI;MIYAJIMA TOSHIHIKO
分类号 H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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