Process for introducing a liquid starting material brought into gas form into a chemical vapour deposition (CVD) reactor comprises forming an aerosol, vaporizing the heat supply and removing the heat of vaporization

摘要

Process for introducing a liquid starting material brought into gas form into a CVD reactor comprises forming an aerosol, vaporizing the heat supply and removing the heat of vaporization. An Independent claim is also included for a device for introducing a liquid starting material brought into gas form into a CVD reactor comprising a nozzle (1) for forming an aerosol and consisting of a liquid channel (2) opening into a gas flow channel (3). The heat supply is preferably carried out by tempering a gas. The aerosol flowing through the gas flow channel is fed into a wall-heated vaporizing chamber.