发明名称 |
PLASMA APPARATUS HAVING VIEW PORT |
摘要 |
PURPOSE: A plasma apparatus having a view port is provided to make an operator easily inspect a wafer from the outside of a process chamber when a problem occurs in the plasma apparatus having a plurality of shower heads, by installing the view port to guarantee the sight of the inside of the chamber. CONSTITUTION: The plasma apparatus(10) uses the process chamber(20) in which the plurality of shower heads are installed. The first view port(60) is installed in one side of the process chamber. The second view port(70) is installed in the other side of the process chamber so that the second view port is opposite to the first view port.
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申请公布号 |
KR20020037861(A) |
申请公布日期 |
2002.05.23 |
申请号 |
KR20000067784 |
申请日期 |
2000.11.15 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, CHANG MIN;LIM, JEON SIK |
分类号 |
H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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