Polishing media stabilizer

摘要

The disclosure relates to a polishing apparatus employing a polishing media (310) retention arrangement to prevent slippage or wrinkles in the polishing media during polishing of a substrate (260). The polishing media is drawn against a support surface (356, 355) by a vacuum (190, 192) applied between the polishing media and the support surface. Also, a porous layer may be placed between the polishing media and the support surface to form dimples in the polishing media upon the application of vacuum. An alternative arrangement draws the polishing media against a carrier and the substrate to be polished.