| 摘要 |
PROBLEM TO BE SOLVED: To provide an inexpensive photosensitive composition for sandblast having superior alkali developability, good sensitivity and high adhesion, also having high elasticity, high flexibility and superior sandblast resistance after patterning and suitable for use in the microfabrication of a metallic pattern and an insulating pattern and to provide a photographic sensitive film using the composition. SOLUTION: In the photosensitive composition for sandblast containing (A) a photopolymerizable urethane (meth)acrylate oligomer having a (meth)acryloyl group, (B) an acrylic copolymer and (C) a photopolymerization initiator, the acrylic copolymer (B) contains at least one copolymerizable monomer having a benzene or cyclohexyl ring as a monomer unit. And the photographic sensitive film using the composition is provided. |
