| 摘要 |
PROBLEM TO BE SOLVED: To provide a system and a method using ion implantation, efficiently manufacturing a medical implant and providing efficient control of a radioactive amount. SOLUTION: In this medical implant used for brachytherapy or other medical treatment wherein radioactive ions are preferably implanted into a silicon-based material, radioactive xenon ions are used as the radioactive ions, and the radioactive ions are doped into a silicon substrate by the controlled method in an ion implantation process. |
