METHOD OF PLASMA CHEMICAL DEPOSITION FOR COATING TITANIUM-SILICON-NITROGEN ON INSTRUMENT

摘要

PURPOSE: A method of plasma chemical deposition for coating titanium-silicon-nitrogen on an instrument is provided to lengthen a life time of the instrument by coating titanium-silicon-nitrogen on the instrument. CONSTITUTION: A gas supply part(100) is used for supplying gases of N2, H2, and Ar into an inside of a reaction furnace(38). The gas supply part(100) is formed with a controller(10) and a plurality of bubbler(16,30), and a plurality of cooler(32). A vacuum part(400) is formed with the rotary pump(58). The rotary pump(58) is used for maintaining a low pressure in the inside of the reaction furnace(38). The pressure of the reaction furnace is measured by a convectron(40) and a Pirani vacuum pressure meter. An RF generator(50) is used for generating plasma. A matching network(48) is installed between the reaction furnace(38) and the RF generator(50).