发明名称 |
GAS SUPPLY DEVICE IN SEMICONDUCTOR FABRICATING PROCESS AND GAS SUPPLY METHOD USING THE SAME |
摘要 |
PURPOSE: A gas supply device in a semiconductor fabricating process and a gas supply method using the same are provided to prevent processing errors due to an insufficient supply of gas by checking correctly the supply amount of gas. CONSTITUTION: A sensor portion(50) is installed in a bombe(10) to check the amount of remaining gas in the bombe(10). The pressure of the gas supplied from the bombe(10) is lowered by a regulator valve(20) and a mass flow controller(30). The mass flow controller(30) is used for supplying the gas to each main equipment. A control portion(60) is used for calculating the necessary gas amount of each step by measuring a pressure and a speed of the supplied gas. The control portion(60) is used for deciding a state of a fabricating process by comparing the necessary gas amount of each step with the remaining amount of gas checked by the sensor portion(50).
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申请公布号 |
KR20020036256(A) |
申请公布日期 |
2002.05.16 |
申请号 |
KR20000066352 |
申请日期 |
2000.11.09 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
AHN, GYE HONG;KIM, JAE GU;KIM, JONG SIK;SEO, DAE MAN |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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