发明名称 GAS SUPPLY DEVICE IN SEMICONDUCTOR FABRICATING PROCESS AND GAS SUPPLY METHOD USING THE SAME
摘要 PURPOSE: A gas supply device in a semiconductor fabricating process and a gas supply method using the same are provided to prevent processing errors due to an insufficient supply of gas by checking correctly the supply amount of gas. CONSTITUTION: A sensor portion(50) is installed in a bombe(10) to check the amount of remaining gas in the bombe(10). The pressure of the gas supplied from the bombe(10) is lowered by a regulator valve(20) and a mass flow controller(30). The mass flow controller(30) is used for supplying the gas to each main equipment. A control portion(60) is used for calculating the necessary gas amount of each step by measuring a pressure and a speed of the supplied gas. The control portion(60) is used for deciding a state of a fabricating process by comparing the necessary gas amount of each step with the remaining amount of gas checked by the sensor portion(50).
申请公布号 KR20020036256(A) 申请公布日期 2002.05.16
申请号 KR20000066352 申请日期 2000.11.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 AHN, GYE HONG;KIM, JAE GU;KIM, JONG SIK;SEO, DAE MAN
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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