发明名称 SPUTTERING TARGET MATERIAL FOR THIN FILM DEPOSITION AND THIN FILM AND OPTICAL RECORDING MEDIUM USING THE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide an alloy material which maintains high reflectance, has enhanced weather resistance, is easily produced as the alloy and has stability and simplicity in a sputtering stage when used as a sputtering target and to provide a thin film and an optical recording medium. SOLUTION: An alloy obtained by incorporating Ag with, by weight, 0.1 to 5.0% Au and containing at least one or more kinds of elements selected from the groups consisting of Cu, Al, Ti, Pd, Ni, V, Ta, W, Mo, Cr, Ru and Mg by 0.1 to 5.0% is used as a sputtering target material for thin film deposition, thereby a thin film composing an optical recording medium 10, i.e., a reflection film 16 is deposited, so that the optical recording medium 10 using the reflection film as a composing element is produced.
申请公布号 JP2002129260(A) 申请公布日期 2002.05.09
申请号 JP20000333559 申请日期 2000.10.31
申请人 FURUYA KINZOKU:KK 发明人 UENO TAKASHI;ODA NOBUHIRO
分类号 C23C14/34;C22C5/06;G11B7/24;G11B7/258;G11B7/26 主分类号 C23C14/34
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