RESIN COMPOSITION AND PROCESS FOR PRODUCING THE SAME

摘要

A gas barrier film-forming resin composition containing a resin (A) and a resin (B) is disclosed, wherein the resin (A) is a (co)polymer comprising 5 to 100 wt% of a monomer (a-1), 0 to 95 wt% of a monomer (a-2), and 0 to 95 wt% of another monomer (a-3) based on the total weight of the monomer (a-1) containing the carboxyl group, the monomer (a-2) containing the hydroxyl group and another monomer (a-3); the resin (B) is a (co)polymer comprising 0 to 4 wt% of a monomer (b-1), and 96 to 100 wt% of a monomer (b-2) and/or a monomer (b-3) based on the total weight of the monomer (b-1) containing the carboxyl group, the monomer (b-2) containing the hydroxyl group and the other monomer (b-3); and all the monomers constituting the resin (A) and the resin (B) do not include acrylonitrile, vinyl chloride and vinylidene chloride.