| 发明名称 |
EXPOSURE APPARATUS, SEMICONDUCTOR DEVICE, AND PHOTOMASK |
| 摘要 |
An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm<-1> or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm<-1>. <IMAGE> |
| 申请公布号 |
EP1164629(A4) |
申请公布日期 |
2002.05.08 |
| 申请号 |
EP20000911386 |
申请日期 |
2000.03.27 |
| 申请人 |
ASAHI GLASS COMPANY LTD.;SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. |
发明人 |
OGAWA, TOHRU;HOSONO, HIDEO;KIKUGAWA, SHINYA;IKUTA, YOSHIAKI;MASUI, AKIO;SHIMODAIRA, NORIAKI;YOSHIZAWA, SHUHEI |
| 分类号 |
H01L21/027;C03B20/00;C03C3/06;G03F1/60;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
