发明名称 POSITIVE TYPE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE AND PHOTOMECHANICAL PROCESS FOR THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive planographic printing plate excellent in development latitude, that is, both sensitivity and the residual film rate of an unexposed part after alkali development and free of the impairment of processing stability even when many plates are developed with a developing solution. SOLUTION: The photosensitive planographic printing plate has a positive type photosensitive composition layer containing (A) a photothermal converting material, (B) an alkali-soluble resin, (C) a surfactant having an HLB(hydrophile- lipophile balance) of <10 and (D) a surfactant having an HLB of >=10 on the base.
申请公布号 JP2002122982(A) 申请公布日期 2002.04.26
申请号 JP20000313370 申请日期 2000.10.13
申请人 MITSUBISHI CHEMICALS CORP 发明人 TSURUYA YASUYUKI
分类号 G03F7/004;B41N1/14;G03F7/00;G03F7/032 主分类号 G03F7/004
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