发明名称 METHOD FOR MANUFACTURING PHOTO MASK, PHOTO MASK, REFLECTING PLATE, AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a photo mask permitting manufacture of a favorable liquid crystal display device by suppressing generation of striped irregularity accompanied by seams of scanning and variation in an exposure dose of light for scanning, and to provide a manufacturing method therefor. SOLUTION: Scanning is performed not in sequential order in the scanning direction, but performed in back-and-forth order. Namely, the scanning is performed in such order as after a scan width W1 is scanned, a scan width W3 is scanned with a scan width W2 skipped, and then a scan width W2 is scanned by coming back one section.
申请公布号 JP2002122979(A) 申请公布日期 2002.04.26
申请号 JP20000313160 申请日期 2000.10.13
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 YAMANAKA YASUHIKO;WAKITA HISAHIDE
分类号 G02F1/1335;G03F1/76;G03F7/20 主分类号 G02F1/1335
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