发明名称 |
METHOD FOR MANUFACTURING PHOTO MASK, PHOTO MASK, REFLECTING PLATE, AND LIQUID CRYSTAL DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a photo mask permitting manufacture of a favorable liquid crystal display device by suppressing generation of striped irregularity accompanied by seams of scanning and variation in an exposure dose of light for scanning, and to provide a manufacturing method therefor. SOLUTION: Scanning is performed not in sequential order in the scanning direction, but performed in back-and-forth order. Namely, the scanning is performed in such order as after a scan width W1 is scanned, a scan width W3 is scanned with a scan width W2 skipped, and then a scan width W2 is scanned by coming back one section. |
申请公布号 |
JP2002122979(A) |
申请公布日期 |
2002.04.26 |
申请号 |
JP20000313160 |
申请日期 |
2000.10.13 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
YAMANAKA YASUHIKO;WAKITA HISAHIDE |
分类号 |
G02F1/1335;G03F1/76;G03F7/20 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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