发明名称 |
ELECTRODEPOSITION FILM-FORMING LIQUID AND METHOD FOR FORMING ELECTRODEPOSITION FILM |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electrodeposition film-forming liquid capable of stably forming an electrodeposition film of smooth surface at a low energy, and to provide a method for forming an electrodeposition film with slight hydrogen gas generation using the liquid. SOLUTION: This electrodeposition film-forming liquid comprises a polymer having acidic functional group, a basic compound and water; wherein the neutralization percentage of the polymer is characterized by being X to (X+30)% [X is the neutralization percentage of the polymer (neutralization percentage with solid phase formation) at 25 deg.C when the viscosity of the liquid becomes minimum], and it is preferable that the polymer contains at least one kind of copolymerizable component selected from acrylic acid-derived constituent and methacrylic acid-derived constituent and the acid value of the polymer is 100-160. The other objective method for forming an electrodeposition film is characterized by comprising forming the electrodeposition film on the surface of a conductive board using the electrodeposition film-forming liquid.</p> |
申请公布号 |
JP2002121498(A) |
申请公布日期 |
2002.04.23 |
申请号 |
JP20000314224 |
申请日期 |
2000.10.13 |
申请人 |
FUJI XEROX CO LTD |
发明人 |
KOBAYASHI TAKAKO;HIRAOKA SATOSHI;INABA YOSHIHIRO;AKUTSU HIDEKAZU |
分类号 |
G02B5/20;C08F8/44;C09D5/44;C09D157/06;C09D201/02;C25D9/02;(IPC1-7):C09D201/02 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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