| 摘要 |
PROBLEM TO BE SOLVED: To improve productivity of charged beam exposure. SOLUTION: This exposure treatment device carries out exposure by charged beams, and has a pattern information acquisition means 8 for acquiring information on an opening pattern 6 formed at an aperture section 5 for partial by grouping exposure, a pattern information retention means 25 for maintaining information on a comparison pattern 27 that is compared with the opening pattern, and a pattern identification means 26 for identifying the shape of the opening pattern according to the result of comparison between the information on the opening pattern acquired by the pattern information acquisition means and that on the comparison pattern retained by the pattern information retention means.
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