MANUFACTURING METHOD OF MULTI-LAYER THIN FILM PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a multi-layer film pattern which can fully prevent generation of an overhang part which overhangs from an end plane of a multi-layer film pattern, as well as generation of a failure caused by that overhang in the manufacturing method of a multi-layer film including a process of patterning the multi-layer film pattern in batch using one photomask. SOLUTION: When the patterning of a multi-layer film, composed of a metal film 5 and an amorphous ITO film 4 which covers the metal film 5, is performed, a sequence of processes is executed as follows: (a) etching of the ITO film 4→(b) sufficient etching of the metal film 5→(c) etching to remove overhang part from the metal film 5 of the ITO film 4. Otherwise a sequence of processes as follows is executed: (a) etching of the ITO film 4 under a resist pattern prior to post baking→(b) extension of the resist pattern by the post baking→(c) etching of the metal film 5 under the resist pattern after the post- baking.