发明名称 RESONANCE TUNNEL DIODE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To realize a resonance tunnel diode RTD improving its P/V ratio by suppressing a heat-excited current and a surface current of the RTD. SOLUTION: A method for manufacturing the RTD comprises the steps of steam-oxidizing a compound semiconductor having a high Al composition, that is, an AlAs layer to form a barrier layer 24 and a barrier layer 26 made of an Al2O3.
申请公布号 JP2002111012(A) 申请公布日期 2002.04.12
申请号 JP20000302016 申请日期 2000.10.02
申请人 FUJITSU LTD 发明人 OKAMOTO NAOYA
分类号 H01L29/205;H01L29/66;H01L29/88;(IPC1-7):H01L29/88 主分类号 H01L29/205
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