| 摘要 |
PROBLEM TO BE SOLVED: To improve a distribution of plasma around a circumference on an upper surface of a work to be processed. SOLUTION: An antenna for supplying a high frequency into a processing chamber 30 is provided with a plurality of loops which are formed with conductive lines 31A-31D connected parallel to a high frequency source 43 and have a surrounding length equal to reach other. These loops are located so that the loop surfaces are opposed against a setting table accommodated inside the processing chamber. |
