METHOD FOR MANUFACTURING PHOTOMASK, AND PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To prevent the flawing of an exposure system due to the breaking of glass or another trouble without lowering the precision of exposure using a glass dry plate excellent in dimensional stability. SOLUTION: A pattern for exposure is formed on one face of a glass base and a transparent substrate is stuck to the other face by way of an adhesive layer to obtain the objective photomask.