| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE MATERIAL USING THE SAME |
| 摘要 |
PROBLEM TO BE SOLVED: To enhance the sensitivity of a photosensitive material. SOLUTION: The photosensitive resin composition contains a compound of formula (1). A high sensitivity photosensitive material can be provided by using the photosensitive resin composition. |
| 申请公布号 |
JP2002082434(A) |
申请公布日期 |
2002.03.22 |
| 申请号 |
JP20000271532 |
申请日期 |
2000.09.07 |
| 申请人 |
HODOGAYA CHEM CO LTD |
发明人 |
YOSHIKAWA KATSUMASA;TARUMOTO NAOHIRO;KOMATSU SHIHOKO;MIKI TETSUZO |
| 分类号 |
G03F7/029;C08F2/44;C08F2/50;C08F291/06;G03F7/027;G03F7/032;H05K3/00 |
主分类号 |
G03F7/029 |
| 代理机构 |
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代理人 |
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| 主权项 |
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