发明名称 |
METHOD FOR POLISHING A MEMORY OR RIGID DISK WITH A PHOSPHATE ION-CONTAINING POLISHING SYSTEM |
摘要 |
A method and system for planarizing or polishing a substrate, particularly a memory or rigid disk, are provided. The method comprises abrading at least a portion of the surface with a polishing sytem comprising (i) a polishing composition comprising water, an oxidizing agent, and about 0.04 M or higher phosphate ion or phosphonate ion, and (ii) abrasive material. The present invention also provides a system for planarizing or polishing a substrate comprising (i) a polishing composition comprising water, an oxidizing agent, and about 0.04 M or higher phosphate ion or phosphonate ion, and (ii) silica particles. |
申请公布号 |
WO0198201(A3) |
申请公布日期 |
2002.03.21 |
申请号 |
WO2001US18056 |
申请日期 |
2001.06.04 |
申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
FANG, MINGMING;WANG, SHUMIN;CHOU, HOMER |
分类号 |
B24B37/00;C09G1/02;C09K3/14;G11B5/84 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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