| 摘要 |
PURPOSE: A reaction container for a thin film deposition equipment is provided which is capable of effectively preventing leakage of reaction gases generated from bonding surfaces of neighboring reaction plates forming a reaction chamber and bonding surfaces of a separation plate and the reaction plates. CONSTITUTION: The reaction container for a thin film deposition equipment comprises at least two reaction plates(110a,110b) at each of which gas inlet parts(160a,160b) are equipped, one side of which is opened while the other side of which is connected to the gas inlet parts in the state that the reaction plates are associated with each other, and which forms one reaction chamber(130); a coupling means coupling reaction plates into one; a separation plate which is installed between the gas inlet parts of the reaction plates so as to prevent mixing of reaction gases flown into each of the reaction plates; grooves(170a,170b) each of which are installed at contact surfaces of the reaction plates so that they correspond to the reaction plates, and which are installed in such a manner that the grooves encircle the gas inlet parts and the reaction chamber except the opened part of the reaction chamber; and a sealing member(150) which is installed in a space formed by the grooves corresponding to the reaction plates, wherein the edge part of the separation plate is contacted with one side surface of the sealing member in the gas inlet parts.
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