ETCHING ACCURACY EVALUATING METHOD AND TESTING SUBSTRATE THEREFOR

摘要

PROBLEM TO BE SOLVED: To accurately evaluate an etching accuracy against all over a substrate in a short time. SOLUTION: This method for evaluating the etching accuracy comprises forming a test pattern 2 for measuring resistance including test patterns 21-24 each with a predetermined width and a space between lines arranged in rows and columns on all over the test substrate, measuring a resistance value after etching, and assuming a finished state of a circuit pattern by converting the resistance value into the widths of the line.