发明名称 Extreme-UV scanning wafer and reticle stages
摘要 A stage for precise positioning of a chuck in three orthogonal linear axes and in three orthogonal rotation axes that includes first and second subassemblies. The a first subassembly includes (i) a monolithic mirror that supports the chuck wherein the monolithic mirror has at least two polished orthogonal faces for interferometric determination of the X, Y, and &THgr;z positions; (ii) a plurality of electromagnetic actuators that control fine positioning in all six axes and coarse positioning in one axis; (iii) a position sensor for measuring the vertical Z position of the monolithic mirror; and (iv) a Lorentz actuator, that includes magnet array, for effecting motion in the Y axis. The a second subassembly comprising a stepping axis beam over which the first subassembly is suspended, wherein the stepping axis beam includes a drive coil array for the Lorentz actuator. T the stage can also include a cable stage subassembly that is positioned a fixed distance away from the monolithic mirror and/or a mechanical zero reference for the first subassembly.
申请公布号 US6353271(B1) 申请公布日期 2002.03.05
申请号 US19990430858 申请日期 1999.10.29
申请人 EUV, LLC 发明人 WILLIAMS MARK E.
分类号 G03F7/20;(IPC1-7):H02K41/00 主分类号 G03F7/20
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