| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material having good antistatic performance and excellent in suitability to working without impairing photographic performance. SOLUTION: In the heat developable photosensitive material with a photosensitive layer containing a binder, an organic silver salt, a reducing agent for silver ions and photosensitive silver halide grains on one face of the base, a compound of the formula Z-P-L-(C=Q)-Y [where P is O, S or NH; Q is O or S; Y is OH, OM, SH, SM (M is a counter ion) or NH2; L is a divalent linking group; and Z is alkyl, aryl or a heterocyclic group] is contained by 0.001-0.2 mol per 1 mol organic silver salt, and the photosensitive material further has an electrically conducting layer formed by dispersing at least one crystalline metal oxide selected from the group comprising ZnO, TiO2, SnO2, Al2O3, In2O3, SiO2, MgO, BaO and MoO3 or a multiple oxide of these in a binder and has <=1011Ωlateral resistance in an environment at 25 deg.C and 10% relative humidity.
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