发明名称 Transistor device of MOS structure in which variation of output impedance resulting from manufacturing error is reduced
摘要 A MOS (Metal Oxide Semiconductor) transistor includes a gate electrode, a drain electrode, and a source electrode. The MOS transistor has an on-state resistance when the MOS transistor is in an ON state. The MOS transistor further includes a specific electrode, wherein the specific electrode connects the source electrode to a power supply section to which a power is supplied. The specific electrode has a resistance substantially identical to the on-state resistance. The specific electrode has a width substantially identical to a width of the gate electrode. The specific electrode and the gate electrode are formed at a same time.
申请公布号 US6351015(B1) 申请公布日期 2002.02.26
申请号 US19990474770 申请日期 1999.12.30
申请人 NEC CORPORATION 发明人 OHNO TSUYOSHI
分类号 H01L27/04;H01L21/822;H01L21/8234;H01L21/8238;H01L27/06;H01L27/092;H01L29/43;H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L27/04
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