发明名称 COMPOUND SEMICONDUCTOR EPITAXIAL WAFER AND HETEROBIPOLAR TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To provide a compound semiconductor epitaxial wafer, in which an attempt is made to prevent a current gain from lowering by decreasing a recombination near an emitter layer; and a heterobipolar transistor. SOLUTION: In a heterojunction bipolar transistor, in which a GaAs base layer 14 and a GaAs emitter cap layer 12 are formed on a GaAs substrate 17 via an InGaP emitter layer 13, an interface between the InGaP emitter layer 13 is doped with a prescribed amount of Se; and the GaAs emitter cap layer 12 and GaAs base layer 14, whereby recombinations near the InGaP emitter layer 13 are decreased.
申请公布号 JP2002050630(A) 申请公布日期 2002.02.15
申请号 JP20000235231 申请日期 2000.08.03
申请人 HITACHI CABLE LTD 发明人 SAITO TOSHIYA;OTOGI YOHEI;TSUJI TAKAYUKI
分类号 H01L29/73;H01L21/331;H01L29/205;(IPC1-7):H01L21/331 主分类号 H01L29/73
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