发明名称 Multi-beam laser exposer unit
摘要 A multi-beam laser exposure unit of the present invention includes a light beam deflector for deflecting a light beam in a predetermined direction, a plurality of laser devices, a pre-optical system, including a glass lens and a plastic lens, for converting a cross sectional shape a of light beam emitted from the respective laser devices to a predetermined shape, and a post-deflection optical system, including two lenses for image-forming each light beam deflected by the deflector to be scanned on a predetermined image surface at a uniform speed. The power of the two lenses of the post-deflection optical system is defined to be positive in a direction parallel to a rotational axis of reflective surfaces of the deflector. Also, at least one lens surface of these lenses is formed not to include a rotational symmetrical surface.
申请公布号 US6347003(B1) 申请公布日期 2002.02.12
申请号 US19990377906 申请日期 1999.08.20
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 SHIRAISHI TAKASHI;YAMAGUCHI MASAO
分类号 B41J2/44;G02B13/00;G02B13/18;G02B26/10;G02B26/12;(IPC1-7):G02B26/08 主分类号 B41J2/44
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