发明名称 |
JIG FOR HEAT TREATING SEMICONDUCTOR WAFER AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a jig for heat treating semiconductor wafer and a method for manufacturing the same causing no crystal defect such as slip on the semiconductor wafer under high temperature heat treatment. SOLUTION: The jig for heat treating a semiconductor wafer and the method for manufacturing the same comprises a wafer holding member formed capable of holding the semiconductor wafer, and a holding surface built on the wafer holding member for contacting and holding the semiconductor wafer with powder of heat-resistant high purity materials adhering on the same.</p> |
申请公布号 |
JP2002043239(A) |
申请公布日期 |
2002.02.08 |
申请号 |
JP20000222031 |
申请日期 |
2000.07.24 |
申请人 |
TOSHIBA CERAMICS CO LTD |
发明人 |
SAKAGAMI HIROYUKI;KOSEKI HIROO |
分类号 |
H01L21/683;H01L21/205;H01L21/22;H01L21/68;(IPC1-7):H01L21/22 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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