发明名称 VERTICAL-TYPE SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vertical-type semiconductor manufacturing apparatus, which can improve temperature detection accuracy and eliminates troubles in changing compensation conductors. SOLUTION: This apparatus comprises a reaction tube 3, having a lower end opening, a furnace opening cap 8 moved vertically by a boat elevator 10 to open and close the lower end opening of the reaction tube 3, a boat 7 carried on the furnace opening cap 8 which is moved up vertically to carry the boat in and out of the reaction tube 3 through the lower opening, a thermocouple 15 mounted on the furnace opening cap 8 so as to be carried in and out of the reaction tube 3 together with the boat 7, and a detector 25 connected to strands of the thermocouple 15 led out through the furnace opening cap 8 for converting the thermoelectromotive force of the thermocouple 15 to an electrical signal, the detector 25 is mounted on an elevator arm 9 holding the furnace opening cap 8 and the electrical signal outputted from the detector 25 is sent to a temperature controller 20 through a normal signal line 26, rather than through the compensating conductors.
申请公布号 JP2001126997(A) 申请公布日期 2001.05.11
申请号 JP19990308179 申请日期 1999.10.29
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 NAKAMURA NAOTO
分类号 H01L21/22;G01K1/14;G01K7/02;G01K13/00;H01L21/205;(IPC1-7):H01L21/22 主分类号 H01L21/22
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