METHODS FOR HIGH-PRECISION GAP AND ORIENTATION SENSING BETWEEN A TRANSPARENT TEMPLATE AND SUBSTRATE FOR IMPRINT LITHOGRAPHY
摘要
Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques.
申请公布号
WO0210721(A2)
申请公布日期
2002.02.07
申请号
WO2001US24216
申请日期
2001.08.01
申请人
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
发明人
BAILEY, TODD;CHOI, BYUNG, JIN;COLBURN, MATTHEW;SREENIVASAN, S., V.;WILLSON, C., GRANT;ECKERDT, JOHN
