| 摘要 |
PURPOSE: A method for forming a film pattern on metal is provided to prevent notch phenomena of metal surface due to scattered reflection. CONSTITUTION: The method includes the steps of injecting Ar gas onto a metal film(2) formed on a substrate(1) to decrease reflection degree from 190-210 % to 180-190 %; applying a photosensitive film on the metal film, followed by forming a photosensitive patter through lithography; and etching the photosensitive pattern by etching mask to form a metal film pattern, followed by removal of the photosensitive pattern.
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