| 发明名称 |
Pattern formation material and pattern formation method |
| 摘要 |
A pattern formation material includes a base polymer. The base polymer includes a polymer of the acrylic family having a chlorine atom or a chlorinated alkyl group bonded to a carbon atom bonded to an ester site in the principal chain of an acrylic unit.
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| 申请公布号 |
US2002012870(A1) |
申请公布日期 |
2002.01.31 |
| 申请号 |
US20010837879 |
申请日期 |
2001.04.19 |
| 申请人 |
KISHIMURA SHINJI;SASAGO MASARU |
发明人 |
KISHIMURA SHINJI;SASAGO MASARU |
| 分类号 |
C08F20/22;C08F20/24;C08K5/00;C08L33/16;G03F7/004;G03F7/033;G03F7/039;G03F7/20;H01L21/027;(IPC1-7):G03F7/038 |
主分类号 |
C08F20/22 |
| 代理机构 |
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代理人 |
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